Industry News | Slkor Semiconductors

Official report from the United States: In-depth analysis of the current situation, demand, and development of EUV lithography (VII)

Updated: 2023-10-14
Views: 5935

At the working group meeting, researchers from NIST discussed three main themes related to using EUV as an analytical tool to assist the semiconductor manufacturing industry. The three methods for utilizing EUV light as an analytical technique are: (1) high harmonic generation (HHG), (2) synchrotron radiation, and (3) ……

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Official report from the United States: In-depth analysis of the current situation, demand, and development of EUV lithography (VI)

Updated: 2023-10-14
Views: 6089

The main process change that affects yield is edge-placement error (EPE). This occurs when unexpected nanoscale irregularities are displayed in the edges and sidewalls of photoresist patterns. These irregularities are random and colloquially referred to as line-edge roughness (LER). As device sizes continue to shrink, ……

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Official report from the United States: In-depth analysis of the current situation, demand, and development of EUV lithography (V)

Updated: 2023-10-14
Views: 5674

Absolute radiometric measurement is important not only for the development of lithography processes and instrument acceptance tests but also for the quantitative understanding of EUV light generation processes. Predictive modeling of this process has lagged behind the development of EUV tools themselves. Improving mode……

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Official report from the United States: In-depth analysis of the current situation, demand, and development of EUV lithography (IV)

Updated: 2023-10-14
Views: 5891

NIST is currently developing an instrument for measuring SoS at higher pressures and temperatures. The SoS instrument is part of Dr. Elizabeth Rasmussen's National Research Council (NRC) postdoctoral fellowship in metal additive manufacturing. A U.S. patent on the design and operation of the instrument was submitted in……

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Official report from the United States: In-depth analysis of the current situation, demand, and development of EUV lithography (III)

Updated: 2023-10-14
Views: 6035

2.1 Droplet Generator: Extreme Thermophysical Properties and Modeling The droplet generator is an important component of the EUVL scanner assembly (Figure 3)……

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Official report from the United States: In-depth analysis of the current situation, demand, and development of EUV lithography (II)

Updated: 2023-10-14
Views: 5232

Overview of NIST and Chip Metrology Program

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Official report from the United States: In-depth analysis of the current situation, demand, and development of EUV lithography (I)

Updated: 2023-10-14
Views: 5895

In 2022, the semiconductor market was approximately 0.6 trillion USD, and commercial analysts predict that it will double to 1.0-1.3 trillion USD by 2030. The significant growth in the semiconductor manufacturing industry can be seen in the lithography process. Lithography is a patterning process that transfers a flat ……

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Russian Chip Plan: Mass Production of 28nm Chips by 2027 and 14nm Chips by 2030

Updated: 2023-10-13
Views: 6073

Due to the war with Ukraine and the resulting global isolation and sanctions, Russia is devising a plan to revive its struggling domestic semiconductor manufac……

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Global First! China Achieves Major Breakthrough in Chip Field

Updated: 2023-10-13
Views: 5594

For the same task, the energy consumption of this chip for on-chip learning is only 3% of that of the Advanced Process-Specific Integrated Circuit (ASIC) syste……

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What are the unique features of OpenAI's self-developed chips? II

Updated: 2023-10-10
Views: 5513

Recently, Reuters reported that OpenAI is considering self-developed chips. According to the report, since last year, OpenAI has been actively seeking solutions to the shortage of training chips for artificial intelligence models (specifically, the scarcity of Nvidia GPUs). Currently, OpenAI is actively preparing for s……

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What are the unique features of OpenAI's self-developed chips? I

Updated: 2023-10-10
Views: 5801

Recently, Reuters reported that OpenAI is considering self-developed chips. According to the report, since last year, OpenAI has been actively seeking solutions to the shortage of training chips for artificial intelligence models (specifically, the scarcity of Nvidia GPUs). Currently, OpenAI is actively preparing for s……

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New advances in the development of domestically-produced EUV lithography machine light sources

Updated: 2023-09-28
Views: 6074

Professor Tang Chuanxiang's team from the Department of Engineering Physics at Tsinghua University has made significant progress in the research of extreme ultraviolet (EUV) lithography machine light sources. This light source project is called SSMB-E

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