Industry News | Slkor Semiconductors

Zero Voltage Switching (ZVS) Circuit Principles and Design

Updated: 2023-12-25
Views: 13033

Zero Voltage Switching (ZVS) / Zero Current Switching (ZCS) technology, also known as soft-switching technology, can improve the efficiency of low-power soft-switching power supplies up to 80% to 85%. In the 1970s, resonant switching power supplies laid the foundation for soft-switching technology.

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Apple brings the world's first 3nm computer chip

Updated: 2023-11-03
Views: 9221

In the development of computer processors, there is a very interesting period in history. From 2009 to 2017, Intel released a total of 7 generations of process……

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MediaTek releases financial report for the third quarter of 2023

Updated: 2023-10-28
Views: 9402

MediaTek releases financial report for the third quarter of 2023

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Official report from the United States: In-depth analysis of the current situation, demand, and development of EUV lithography (IX)

Updated: 2023-10-14
Views: 8671

In addition to the laboratory-scale EUV light used by NIST to analyze semiconductor components, Dr. Steve Grantham also presented a wealth of resources at NIST's Synchrotron Ultraviolet Radiation Facility (SURF III) during the working group meeting. When charged particles move along a curved path, they emit synchrot……

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Official report from the United States: In-depth analysis of the current situation, demand, and development of EUV lithography (VIII)

Updated: 2023-10-14
Views: 7962

In addition to the laboratory-scale EUV light used by NIST to analyze semiconductor components, Dr. Steve Grantham also presented a wealth of resources at NIST's Synchrotron Ultraviolet Radiation Facility (SURF III) during the working group meeting. When charged particles move along a curved path, they emit synchrot……

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Official report from the United States: In-depth analysis of the current situation, demand, and development of EUV lithography (VII)

Updated: 2023-10-14
Views: 8166

At the working group meeting, researchers from NIST discussed three main themes related to using EUV as an analytical tool to assist the semiconductor manufacturing industry. The three methods for utilizing EUV light as an analytical technique are: (1) high harmonic generation (HHG), (2) synchrotron radiation, and (3) ……

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Official report from the United States: In-depth analysis of the current situation, demand, and development of EUV lithography (VI)

Updated: 2023-10-14
Views: 8730

The main process change that affects yield is edge-placement error (EPE). This occurs when unexpected nanoscale irregularities are displayed in the edges and sidewalls of photoresist patterns. These irregularities are random and colloquially referred to as line-edge roughness (LER). As device sizes continue to shrink, ……

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Official report from the United States: In-depth analysis of the current situation, demand, and development of EUV lithography (V)

Updated: 2023-10-14
Views: 7799

Absolute radiometric measurement is important not only for the development of lithography processes and instrument acceptance tests but also for the quantitative understanding of EUV light generation processes. Predictive modeling of this process has lagged behind the development of EUV tools themselves. Improving mode……

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Official report from the United States: In-depth analysis of the current situation, demand, and development of EUV lithography (IV)

Updated: 2023-10-14
Views: 10190

NIST is currently developing an instrument for measuring SoS at higher pressures and temperatures. The SoS instrument is part of Dr. Elizabeth Rasmussen's National Research Council (NRC) postdoctoral fellowship in metal additive manufacturing. A U.S. patent on the design and operation of the instrument was submitted in……

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Official report from the United States: In-depth analysis of the current situation, demand, and development of EUV lithography (III)

Updated: 2023-10-14
Views: 8814

2.1 Droplet Generator: Extreme Thermophysical Properties and Modeling The droplet generator is an important component of the EUVL scanner assembly (Figure 3)……

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Official report from the United States: In-depth analysis of the current situation, demand, and development of EUV lithography (II)

Updated: 2023-10-14
Views: 7630

Overview of NIST and Chip Metrology Program

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Official report from the United States: In-depth analysis of the current situation, demand, and development of EUV lithography (I)

Updated: 2023-10-14
Views: 9286

In 2022, the semiconductor market was approximately 0.6 trillion USD, and commercial analysts predict that it will double to 1.0-1.3 trillion USD by 2030. The significant growth in the semiconductor manufacturing industry can be seen in the lithography process. Lithography is a patterning process that transfers a flat ……

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