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【Daily Highlight】High-performance MOSFET IRF7341

release time:2024-03-01Author source:SlkorBrowse:6532

As the highly anticipated 2024 Mobile World Congress (MWC2024) approaches in Barcelona, Huawei has finally announced its participation plans, excitingly revealing that they will showcase their brand-new 5G-A full range of products and solutions. This is a significant event for the entire communications industry, especially amidst the opportune timing of 5G development. During this exhibition, Huawei will not only exhibit their newly released 5G products and solutions but will also introduce a communication macro model for the first time. This innovative technology is expected to accelerate the intelligent transformation of operators, bringing disruptive changes to the entire communications industry. The development of 5G networks will not only bring new opportunities to the communications industry but also empower the development of other industries.


As a rapidly growing domestic semiconductor company, SLKOR Micro offers diversified products that can be widely applied in fields such as communications, Internet of Things, and smart connectivity. With the widespread adoption and application of 5G networks, the semiconductor industry will also face new opportunities and challenges. SLKOR Semiconductor will continue to innovate, providing more reliable and efficient semiconductor products for the arrival and advancement of the 5G era.


The IRF7341, a dual N-channel MOSFET from the SLKOR semiconductor series, has garnered significant attention in the field of modern electronic devices. With advanced trench technology and design, the IRF7341 boasts excellent parameters and characteristics, making it suitable for a variety of applications. This article will provide a detailed overview of the IRF7341's relevant parameters, features, and application areas, showcasing its reliability in electronic device and circuit design.

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The IRF7341 is an N-channel MOSFET with a drain-source voltage (Vdss) of 60V and a continuous drain current (Id) of 5A. Its on-resistance (RDS(on)@Vgs,Id) is rated at 30mΩ@10V,4A, and the threshold voltage (Vgs(th)@Id) is specified as 2.5V@250uA. In terms of packaging, the IRF7341 comes in an SOP-8 package, facilitating easy installation and layout. These outstanding parameters indicate that the IRF7341 exhibits superior performance and versatile application characteristics in electronic devices and circuit designs.


The characteristics of IRF7341 are as follows: Firstly, it features low gate charge, enabling faster response times and lower power consumption. IRF7341 adopts advanced high cell density trench technology, achieving ultra-low on-resistance (RDS(on)), providing higher efficiency in performance and energy conversion. Additionally, the excellent packaging design of IRF7341 helps with heat dissipation, enhancing system reliability and longevity.

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In terms of power management, IRF7341 is widely used in various power systems. By controlling the conduction and cutoff of current, effective power management functions can be realized to ensure electronic devices receive stable and efficient power supplies in different operating states. Its fast response and reliability make it an indispensable component in power management circuits. Furthermore, IRF7341 is extensively applied in fields such as power switches. As a power switch device, IRF7341 can achieve fast and stable switching actions in circuits, effectively control the on-off state of the circuit, and ensure the normal operation of electronic devices.


In conclusion, as a high-performance medium-voltage N-channel MOSFET, the IRF7341 exhibits outstanding parameters and characteristics. With the continuous progress of technology and the increasing market demand, the IRF7341 will continue to play a crucial role. SLKOR will also leverage its strengths, keep pace with the times, continuously innovate in research and development, introduce more superior products to meet market demands, and drive the advancement of the electronic device field towards greater efficiency and reliability.

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